Formation of Nanostructures on the Surface of Aluminium—Silicon Films by Bombardment with Low-Energy Argon Ions of Inductive RF Discharge Plasma
- Авторлар: Bachurin V.I.1, Amirov I.I.1, Lobzov K.N.1,2, Simakin S.G.1, Smirnova M.A.1
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Мекемелер:
- Yaroslavl Branch of the Valiev Institute of Physics and Technology of the RAS
- Demidov Yaroslavl State University
- Шығарылым: № 11 (2024)
- Беттер: 24-31
- Бөлім: Articles
- URL: https://freezetech.ru/1028-0960/article/view/681221
- DOI: https://doi.org/10.31857/S1028096024110034
- EDN: https://elibrary.ru/REVPWT
- ID: 681221
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